Achieving large magnetoresistance in Sr 2FeMoO 6 thin films

Journal of Applied Physics

Volumn 97, Issue 4, 2005, Pages

  Song, J H ^a   Park, J H ^a   Jeong, Y H ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITY; GROWTH TEMPERATURE; SPINTRONICS; SUBSTRATE TEMPERATURE;

ANNEALING; FILM GROWTH; MAGNETIZATION; MORPHOLOGY; PARTIAL PRESSURE; PULSED LASER DEPOSITION; QUANTUM INTERFERENCE DEVICES; SINGLE CRYSTALS; STOICHIOMETRY; STRONTIUM COMPOUNDS; SYNCHROTRON RADIATION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MAGNETORESISTANCE;

EID: 13844276006     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1848187     Document Type: Article

References (12)

1. K.-I. Kobayashi et al., Nature (London) 395, 677 (1998).
2. T. H. Kim et al., Appl. Phys. Lett. 74, 1737 (1999).
3. D. Niebieskikwiat et al., Phys. Rev. B 64, 180406(R) (2001).
4. S. Lee et al., Phys. Rev. Lett. 82, 4508 (1999).
5. C. L. Yuan et al., Appl. Phys. Lett. 75, 3853 (1999).
6. T. Manako et al., Appl. Phys. Lett. 74, 2215 (1999).
7. S. R. Shinde et al., J. Appl. Phys. 93, 1605 (2003).
8. H. Asano et al., Appl. Phys. Lett. 74, 3696 (1999).
9. LI. Balcells et al., Appl. Phys. Lett. 78, 781 (2001).
10. W. Westerburg et al., Phys. Rev. B 62, R767 (2000).
11. W. R. Branford et al., J. Appl. Phys. 94, 4714 (2003).
12. E. Rozenberg et al., J. Appl. Phys. 88, 2578 (2000).