Optical properties of SiO2/nanocrystalline Si multilayers studied using spectroscopic ellipsometry

Thin Solid Films

Volumn 476, Issue 1, 2005, Pages 196-200

  Lee, Kang Ju ^a   Kang, Tae Dong ^a   Lee, Hosun ^a   Hong, Seung Hui ^a   Choi, Suk Ho ^a   Seong, Tae Yeon ^b   Kim, Kyung Joong ^c   Moon, Dae Won ^c  

^a Kyung Hee University   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Ellipsometry; Nanostructures; Silicon; Transmission electron microscopy

Indexed keywords

ANNEALING; APPROXIMATION THEORY; DEPOSITION; ELLIPSOMETRY; ION BEAMS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SILICA; SILICON; SPECTROSCOPIC ANALYSIS; SPUTTERING; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION;

DIELECTRIC FUNCTION; HOLE CARRIERS; ION BEAM SPUTTERING (IBS); SPECTROSCOPIC ELLIPSOMETRY (SE);

MULTILAYERS;

EID: 13844256780     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.037     Document Type: Article

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