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Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 283-287
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Effects of nitrogen incorporation on structure of a-C:H films deposited on polycarbonate by plasma CVD
a
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Author keywords
a C:H:N films; Nitrogen incorporation; Plasma enhanced chemical vapor deposition (PECVD); Polycarbonate
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CARBON;
MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCARBONATES;
RAMAN SCATTERING;
X RAY PHOTOELECTRON SPECTROSCOPY;
FRICTION COEFFICIENT;
NITROGEN INCORPORATION;
NITROGEN-INCORPORATED-HYDROGENATED AMORPHOUS CARBON (A-C:H:N) FILMS;
AMORPHOUS FILMS;
CHEMICAL VAPOR DEPOSITION;
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EID: 13844256218
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.126 Document Type: Article |
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Times cited : (16)
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References (12)
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