Simultaneous aggregation and sedimentation of silica particles in the presence of surfactants

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 255, Issue 1-3, 2005, Pages 139-143

  Gupta, J K ^a   Basu, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Aggregation; Electrostatic interaction; Hydrophobic interactions; Sedimentation; Silica; Surfactants

Indexed keywords

AGGLOMERATION; CONCENTRATION (PROCESS); ELECTROSTATICS; HYDROPHOBICITY; MOLECULES; PH EFFECTS; SALTS; SEDIMENTATION; SURFACE ACTIVE AGENTS;

ELECTROSTATIC INTERACTIONS; SILICA PARTICLES;

SILICA;

CALCIUM CHLORIDE; CETRIMIDE; SILICON DIOXIDE; SODIUM BROMIDE; SURFACTANT;

ACCURACY; ARTICLE; ELECTRICITY; HYDROPHOBICITY; INSTRUMENT; MASS; MEASUREMENT; MOLECULAR INTERACTION; PH; PRIORITY JOURNAL; SEDIMENTATION; SEDIMENTATION RATE; SURFACE CHARGE; TIME; WEIGHT;

EID: 13844256108     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2004.12.010     Document Type: Article

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