Trace impurity analysis in Ta films using glow discharge mass spectrometry: Concentration change of impurities by applying negative substrate bias voltage

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 12, 2004, Pages 8267-8272

  Lim, Jae Won ^a   Mimura, Kouji ^a   Isshiki, Minoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Glow discharge mass spectrometry; Ion beam; Ionization potential; Substrate bias voltage; Tantalum

Indexed keywords

CONTAMINATION; DEPOSITION; ELECTRIC POTENTIAL; GLOW DISCHARGES; IMPURITIES; ION BEAMS; IONIZATION; MASS SPECTROMETRY; PLASMAS; SUBSTRATES; TANTALUM; TRACE ANALYSIS;

GLOW DISCHARGE MASS SPECTROMETRY (GDMS); IONIZATION POTENTIAL; PENNING IONIZATION; SUBSTRATE BIAS VOLTAGE;

METALLIC FILMS;

EID: 13644275249     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.8267     Document Type: Article

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