Plasma deposition of thin carbonfluorine films on aligned carbon nanotube

Applied Physics Letters

Volumn 86, Issue 4, 2005, Pages

  He, Peng ^a   Shi, Donglu ^a   Lian, Jie ^b   Wang, L M ^b   Ewing, Rodney C ^b   Van Ooij, Wim ^a   Li, N Z ^c   Ren, Z F ^d  

^a University of Cincinnati   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c FLORIDA INTERNATIONAL UNIVERSITY   (United States)

^d BOSTON COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONFLUORINE FILMS; PLASMA DEPOSITION; PLASMA TREATMENT;

ELECTRONIC EQUIPMENT; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA APPLICATIONS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; THERMAL CONDUCTIVITY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NANOTUBES;

EID: 13644274228     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1846957     Document Type: Article

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