FEA image sensor with electron-beam focusing system

Technical Digest of the 17th International Vacuum Nanoelectronics Conference, IVNC 2004

Volumn , Issue , 2004, Pages 228-229

  Egami, N ^a   Nanba, M ^a   Takiguchi, Y ^a   Osada, K ^a   Watabe, T ^a   Okazaki, S ^a   Obara, Y ^a,b   Tanaka, M ^a,b   Itoh, S ^a,b  

^a NHK SCIENCE AND TECHNICAL RESEARCH LABORATORIES   (Japan)

^b Futaba Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ELECTRON BEAMS; ELECTRON EMISSION; LIGHTING; MAGNETIC FIELD EFFECTS; MAGNETIC FLUX; PERMANENT MAGNETS; PHOTOCONDUCTING MATERIALS; PHOTOCONDUCTIVITY; TARGETS; TELEVISION;

FEA IMAGE SENSORS; HIGH-GAIN AVALANCHE RUSHING AMORPHOUS PHOTOCONDUCTOR (HARP); MESH ELECTRODES; MULTIPLICATION EFFECT;

IMAGE SENSORS;

EID: 13644270708     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. Y. Takiguchi, K. Osada, M. Nanba, K. Miyakawa, T. Yamagishi, K. Tanioka, M. Abe, N. Egami, M. Tanaka, S. Itoh, IEICE Trans. on Electronics, E85-C, 11, pp. 1916-1921(2002).
2. Y. Takiguchi, M. Nanba, K. Osada, T. Watabe, S. Okazaki, N. Egami, K. Tanioka, M. Tanaka, S. Itoh, Technical Digest of IVMC2003, I7-1, pp. 67-68 (2003).