In-situ post-treatment for field emission improvement of carbon nanofibers in inductively coupled plasma system

Technical Digest of the 17th International Vacuum Nanoelectronics Conference, IVNC 2004

Volumn , Issue , 2004, Pages 254-255

  Weng, C H ^a   Lin, Y Y ^a   Tung, C H ^a   Wei, H W ^a   Leou, K C ^a   Tsai, C H ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Carbon nanofibers (CNFs); Field emission; Inductivity coupled plasma chemical vapor deposition (ICP CVD); Post treatment

Indexed keywords

CARBON FIBERS; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRON BEAM PUMPING; ENERGY DISPERSIVE SPECTROSCOPY; FIELD EMISSION CATHODES; INDUCTIVELY COUPLED PLASMA; MICROSCOPIC EXAMINATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SAMARIUM; SUBSTRATES; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

CATALYTIC NANOPARTICLES; FEED GASES; FIELD EMISSION; PROCESS CHAMBERS;

CARBON NANOTUBES;

EID: 13644256986     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. C. H. Weng, K. C. Leou, H. W. Wei, Z. Y. Juang, M. T. Wei, C. H. Tung, and C. H. Tsai, unpublished.
2. H.W. Wei, K.C. Leou, M. T. Wei, K. J. Shen, AVS 50th International symposium, November 2-7, 2003, Baltimore Convention Center, Baltimore, Maryland