High performance single photon sources from photolithographically defined pillar microcavities

Optics Express

Volumn 13, Issue 1, 2005, Pages 50-55

  Bennett, A J ^a   Unitt, D C ^a,b   Atkinson, P ^b   Ritchie, D A ^b   Shields, A J ^a  

^a TOSHIBA CORPORATION   (Japan)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MOLECULAR BEAM EPITAXY; PHOTOLITHOGRAPHY; PHOTOLUMINESCENCE; REFRACTIVE INDEX; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM DOTS;

MICROCAVITIES; PHOTON STATISTICS; PURCELL EFFECT; SPECTROSCOPY, CONDENSED MATTER;

PHOTONS;

EID: 13544251665     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.000050     Document Type: Article

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