Growth of carbon nitride using microwave plasma CVD

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 198-201

  Sakamoto, Yukihiro ^a   Takaya, Matsufumi ^a  

^a CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Carbon nitride; Crystalline; CVD; DLC; Microwave; Plasma

Indexed keywords

CHEMICAL BONDS; CRYSTALLINE MATERIALS; DIAMONDS; METHANE; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE; DLC; MICROWAVE PLASMAS; SUBSTRATE TEMPERATURE;

CARBON NITRIDE;

EID: 13444306420     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.040     Document Type: Conference Paper

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