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Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 235-238
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Preparation of Cr-Si multilayer structures for thin film heater applications
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Author keywords
Magnetron sputtering; Semiconductor processing; Temperature coefficient of resistance; Thin film
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Indexed keywords
ANNEALING;
CHROMIUM;
COMPOSITION;
DEGASSING;
ELECTRIC HEATING ELEMENTS;
MAGNETRON SPUTTERING;
METALLIC FILMS;
MULTILAYERS;
SILICON;
SPUTTERING;
THERMAL EFFECTS;
THERMODYNAMICS;
CHROME-RICH FILMS;
SEMICONDUCTOR PROCESSING;
TEMPERATURE COEFFICIENT OF RESISTANCE;
TEMPERATURE UNIFORMITY;
THIN FILMS;
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EID: 13444293085
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.07.015 Document Type: Conference Paper |
Times cited : (14)
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References (10)
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