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Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 235-238

Preparation of Cr-Si multilayer structures for thin film heater applications

Author keywords

Magnetron sputtering; Semiconductor processing; Temperature coefficient of resistance; Thin film

Indexed keywords

ANNEALING; CHROMIUM; COMPOSITION; DEGASSING; ELECTRIC HEATING ELEMENTS; MAGNETRON SPUTTERING; METALLIC FILMS; MULTILAYERS; SILICON; SPUTTERING; THERMAL EFFECTS; THERMODYNAMICS;

EID: 13444293085     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.07.015     Document Type: Conference Paper
Times cited : (14)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.