Growth and characterization of ZnO films by laser molecular beam epitaxy

Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology

Volumn 24, Issue 6, 2004, Pages 420-423

  He, Yongning ^a   Zhu, Changchun ^a   Hou, Xun ^a,b,c   Zhang, Jingwen ^a   Yang, Xiaodong ^b   Xu, Qing'an ^b   Zeng, Fanguang ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS   (China)

^c HENAN UNIVERSITY   (China)

Author keywords

L MBE growth process; Microelectronics; ZnO ceramic target; ZnO thin film

Indexed keywords

LASER APPLICATIONS; MOLECULAR BEAM EPITAXY; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

CERAMIC TARGET; LASER MOLECULAR BEAM EPITAXY (L-MBE); ZNO FILMS;

SEMICONDUCTING FILMS;

EID: 13444257511     PISSN: 02539748     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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