Fabrication of silicon carbide thin films by plasma immersion ion implantation with self-ignited glow discharge

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 153-157

  An, Zhenghua ^a,b   Fu, Ricky K Y ^a   Chen, Peng ^a   Liu, Weili ^b   Chu, Paul K ^a   Lin, Chenglu ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Glow discharge; Plasma immersion ion implantation; Silicon carbide

Indexed keywords

ACETYLENE; ANNEALING; CHEMICAL BONDS; COMPOSITION; FABRICATION; GLOW DISCHARGES; GRAPHITIZATION; IGNITION; ION IMPLANTATION; METHANE; SILICON; SILICON CARBIDE; SYNTHESIS (CHEMICAL);

PLASMA IMMERSION ION IMPLANTATION;

THIN FILMS;

EID: 1342323718     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01073-3     Document Type: Conference Paper

References (18)

1. Hamakawa Y., Toyama T., Okamoto H. J. Non-Cryst. Solids. 115:1989;180.
2. Melinon P., Blasé X., Keghelian P., Perez A., Pellarin M., Broyer M., Flank A.M., Lagarde P. Phys. Rev. B. 65:2002;5321.
3. Rusli J.C., Yoon S.F., Teo E.J., Yu M.B., Chew K., Ahn J., Zhang Q., Osipowicz T., Watt F. J. Appl. Phys. 89:2001;6153.
4. Kelires P.C. Phys. Rev. B. 62:2000;15686.
5. Finocchi F., Galli G., Parinello M., Bartoni C.M. Phys. Rev. Lett. 68:1992;3044.
6. Huran J., Hrubcin L., Kobzev A.P., Liday J. Vacuum. 47:1996;1223.
7. Anderson D.A., Spear W.E. Philos. Mag. 35:1976;1.
8. Volz K., Baba K., Hatada R., Ensinger W. Surf. Coat. Technol. 136:2001;197.
9. Tian X.B., Peng P., Chu P.K. Phys. Lett. A. 303:2002;67.
10. Tian X.B., Chu P.K. J. Phys. D: Appl. Phys. 34:2001;354.
11. Chu P.K., Qin S., Chan C., Cheung N.W., Ko P.K. IEEE Trans. Plasma Sci. 26:1998;79.
12. Murthy C.S., Posselt M., Frei T. J. Vac. Sci. Technol. B. 14:1996;278.
13. Chen D.H., Cheung W.Y., Wong S.P. Nucl. Instrum. Meth. Phys. Res. B. 148:1999;589.
14. Artamonov V.V., Valakh M.Y., Klyui N.I., Melnik V.P., Romanyuk A.B., Romanyuk B.N., Yuhimchuk V.A. Nucl. Instrum. Methods Phys. Res. B. 147:1999;256.
15. Kim W., Kim H., Lee G., Koo J.Y. Phys. Rev. Lett. 89:2002;6102.
16. Matsumoto T., Kiuchi M., Sugimoto S., Goto S. Surf. Sci. 493:2001;426.
17. McKean D.C., Davidson G., Woodward L.A. Spectrochim. Acta Part A: Mol. Spectrosc. 26:1970;1815.
18. Zhang H., Xu Z. Opt. Mater. 20:2002;177.