Characterization and leakage current density of radio frequency magnetron sputtered nanocrstalline SrTiO3 thin films

Journal of Crystal Growth

Volumn 264, Issue 1-3, 2004, Pages 271-277

  Wang, Moo Chin ^a   Hsiao, Fu Yuan ^b   Wu, Nan Chun ^b  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

A1. X ray diffraction; A2. Natural crystal growth; A3. Polycrystalline deposition; B1. Nanomaterials; B2. Dielectric materials; B3. DRAM capacitor

Indexed keywords

CAPACITORS; CRYSTAL GROWTH; CURRENT DENSITY; DYNAMIC RANDOM ACCESS STORAGE; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; MORPHOLOGY; PEROVSKITE; POLYCRYSTALLINE MATERIALS; STRONTIUM COMPOUNDS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DRAM CAPACITORS; NANOMATERIALS; NATURAL CRYSTAL GROWTH; POLYCRYSTALLINE DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 1342285520     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.12.050     Document Type: Article

References (12)

1. Arlt G., Henning D., de with G. J. Appl. Phys. 58:1985;1619.
2. Martirena H.T., Burfoot J.C. J. Phys. C: Solid State Phys. 7:1974;3182.
3. Komatsu S., Abe K., Fukushima N. Jpn. J. Appl. Phys. 37(Part 1):1998;5651.
4. Sakuma T., Yamamichi S., Matsubara S., Yamafuchi H., Miyasaka Y. Appl. Phys. Lett. 57:1990;2431.
5. Yamaguchi H., Matsubara S., Miyacaka Y. Jpn. J. Appl. Phys. 30(Part 1):1991;2197.
6. Yamaguchi H., Lesaicherre P.Y., Sakuma Y., Miyasaka Y. Jpn. J. Appl. Phys. 32(Part 1):1993;4069.
7. Pratt J.H., Firestone S. J. Vac. Sci. Technol. 8:1971;256.
8. Gerblinger J., Meixner H. J. Appl. Phys. 67:1990;7453.
9. M.C. Wang, F.Y. Hsiao, H.S. Huang, N.C. Wu, Jpn. J. Appl. Phys., (2004, in press).
10. B. Chapman, Glow Discharge Process, Wiley, New York, 1980, pp. 201-203.
11. Wang M.C., Hsiao F.Y., His C.S., Wu N.C. J. Cystal Growth. 246:2002;78.
12. Dietz G.W., Schumacher M., Waser R., Streiffer S.K., Basceri C., Kingon A.I. J. Appl. Phys. 82:1997;2359.