Characterization of deposited Si-clusters by studying their chemical reactivity

Surface Science

Volumn 552, Issue 1-3, 2004, Pages

  Mathes, M ^a   Grass, M ^a   Kim, Y D ^a   Gantefor G ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

Oxygen; Silicon; Silicon carbide; Silicon oxides; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; IONIZATION; MONOMERS; OXYGEN; SCANNING TUNNELING MICROSCOPY; SILICON; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETIC CLUSTERS; MOLECULAR ORBITAL;

SURFACE PHENOMENA;

EID: 1342264257     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.01.014     Document Type: Article

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