Assessment of lithographic process variation effects in InGaAsP annular Bragg resonator lasers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3206-3209

  Green, William M J ^a   Scheuer, Jacob ^a   DeRose, Guy A ^a   Yariv, Amnon ^a   Scherer, Axel ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNULAR GEOMETRY; BRAGG RESONATOR LASERS; LASER EMISSION; ON-CHIP SPECTROSCOPY;

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; LASER BEAMS; OPTICAL PUMPING; RESONANCE; RESONATORS; SEMICONDUCTOR QUANTUM WELLS; SPECTROSCOPIC ANALYSIS;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 13244276409     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808740     Document Type: Conference Paper

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