Natural water specimen preparation for TXRF analysis using a Johansson wavelength-dispersive spectrometer

X-Ray Spectrometry

Volumn 34, Issue 1, 2005, Pages 56-58

  Kurunczi, S ^b   Sakurai, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b KFKI ATOMIC ENERGY RESEARCH INSTITUTE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSION (WAVES); SILICON WAFERS;

ETCHING METHOD; HF ETCHING; HYDROPHOBICS; NATURAL WATERS; SILICON SURFACES; SUPPORTING MATERIAL; TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS; WAVELENGTH DISPERSIVE; WAVELENGTH DISPERSIVE SPECTROMETERS;

SPECIMEN PREPARATION;

EID: 13244257041     PISSN: 00498246     EISSN: None     Source Type: Journal    
DOI: 10.1002/xrs.756     Document Type: Article

References (5)

1. Klockenkamper R. Total-Reflection X-ray Fluorescence Analysis. Wiley: New York, 1997; Chapt. 5.2.1 and references cited therein.
2. Prange A, Boddeker H, Kramer K. Spectrochim. Acta, Part B 1993; 44: 505.
3. Sakurai K, Eba H. Anal. Chem. 2002; 74: 4532.
4. Kern W A, Puotinen DA. RCA Rev. 1970; 31: 187.
5. http:/www.nwri.ca [1 August 2003].