Epitaxial Ag nanowires on Si(111) generated via electron beam lithography in ultrahigh vacuum

Reviews on Advanced Materials Science

Volumn 8, Issue 1, 2004, Pages 1-9

  Zielasek, V ^a   Block, T ^a   Pfnur H ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; DESORPTION; ELECTRON BEAM LITHOGRAPHY; EPITAXIAL GROWTH; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; THERMAL EFFECTS; THICKNESS MEASUREMENT; ULTRAHIGH VACUUM;

ATOMIC LAYERS THICKNESS; CRYSTALLINE METAL NANOWIRES; SAMPLE TEMPERATURE; THERMAL DESORPTION;

SILVER;

EID: 12944271881     PISSN: 16065131     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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