Diagnosis of OH radical by optical emission spectroscopy in atmospheric pressure unsaturated humid air corona discharge and its implication to desulphurization of flue gas

Plasma Chemistry and Plasma Processing

Volumn 25, Issue 1, 2005, Pages 31-40

  Sun, M ^a   Wu, Y ^a   Li, J ^a   Wang, N H ^a   Wu, J ^a   Shang, K F ^a   Zhang, J L ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Atmospheric; Corona discharge; Desulfuration; Diagnosis; Emission spectroscopy; Flue gas; OH radical; Pulsed corona discharge; Water vapor

Indexed keywords

ATMOSPHERIC HUMIDITY; ATMOSPHERICS; DESULFURIZATION; DIAGNOSIS; ELECTRODES; EMISSION SPECTROSCOPY; FLUE GASES; PLASMA APPLICATIONS; POLLUTION CONTROL; VAPORS;

CORONA DISCHARGE; DESULFURATION; OH RADICALS; PULSED CORONA DISCHARGES; WATER VAPOR;

GAS DISCHARGE TUBES;

EID: 12844288675     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-004-8833-6     Document Type: Article

References (17)

1. J. J. Lowke and R. Morow, IEEE Trans. Plasma Sci. 23, 661 (1995).
2. E. M. van Velduizen, W. R. Rutgers, and V. A. Bityurin, Plasma Chem. Plasma Process. 16, 227 (1996).
3. B. M. Penetrante, J. N. Bardsley, and M. C. Hsial, Jpn. J. Appl. Phys. 36, 5007 (1997).
4. R. N. Li and X. Liu, Chem. Eng. Sci. 55, 2481 (2000).
5. J. S. Chang, P. C. Looy, J. Pevler, T. Yoshioka, and K. Nagai, Proc. IEE/IAS Annu. Meet. 1969 (1993).
6. Y. Wu, J. Li, and N. H. Wang, Jpn. J. Appl. Phys. 40, L838 (2001).
7. R. Peyrous, P. Pignolet, and B. Held. J. Phys. D. Appl. Phys. 22, 1658 (1989).
8. I. S. McDermid and J. B. Laudenslager, J. Chem. Phys. 74, 1824 (1982).
9. K. R. German, J. Chem. Phys. 62, 2584 (1975).
10. C. Hibert, I. Gaurand, O. Motret, and J. M. Pousesle, J. Appl. Phys. 85, 7070 (1999).
11. R. Ono and T. Oda, IEEE Trans. Indus. Appl. 37, 709 (2002).
12. M. C. Van Beek and J. J. Ter Meulen, Chem. Phys. Lett. 337, 237 (2002).
13. R. Ono and T. Oda, J. Electrostal. 55, 333 (2002).
14. A. Ershov and J. Borysow, J. Phys. D. Appl. Phys. 28, 68 (1995).
15. Z. Falkenstein, J. Appl. Phys. 81, 7158 (1997).
16. T. H. Teich, Proc. NATO Adv. Res. Workshop Non-Thermal Plasma Tech. Fallut. Con trol G34 A3, 1022 (1993).
17. J. R. Roth, Industrial Plasma Engineering, Vol. I, Principles. Institute of Physics Press, Bristol, 1995, (Section 12.5.2).