Supercritical water oxidation of wastewater from LCD manufacturing process: Kinetic and formation of chromium oxide nanoparticles

Journal of Supercritical Fluids

Volumn 34, Issue 1, 2005, Pages 51-61

  Veriansyah, Bambang ^a   Park, Tae Joon ^a   Lim, Jong Sung ^b   Lee, Youn Woo ^c  

^a Korea Institute of Science and Technology   (South Korea)

^b Sogang University   (South Korea)

^c Seoul National University   (South Korea)

Author keywords

Chromium oxide; COD; LCD wastewater; Supercritical water oxidation

Indexed keywords

ACTIVATION ENERGY; AMMONIUM COMPOUNDS; CHEMICAL OXYGEN DEMAND; CHROMIUM COMPOUNDS; DATA REDUCTION; DECOMPOSITION; LIQUID CRYSTAL DISPLAYS; NANOSTRUCTURED MATERIALS; OXIDATION; PRESSURE EFFECTS;

CHROMIUM OXIDE; FLOW REACTORS; OXIDANTS; SUPERCRITICAL WATER OXIDATION (SCWO);

WASTEWATER;

CHROMIC ACID; CHROMIUM; DICHROMATE AMMONIUM; HYDROGEN PEROXIDE; UNCLASSIFIED DRUG;

ARTICLE; DEVICE; ELECTROPHORESIS; ENERGY; INDUSTRY; LIGHT SCATTERING; NANOPARTICLE; OXIDATION; PARTICLE SIZE; PRESSURE; REACTION TIME; SCANNING ELECTRON MICROSCOPY; SUPERCRITICAL FLUID; SUPERCRITICAL WATER OXIDATION; TEMPERATURE DEPENDENCE; WASTE WATER;

EID: 12844270544     PISSN: 08968446     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.supflu.2004.10.001     Document Type: Article

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