Nanofabrication by direct epitaxial growth

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 519-522

  Eres, Gyula ^c   Hui, F Y C ^a   Thundat, T G ^a   Joy, D C ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

^c University of Tennessee ^*

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; NANOTECHNOLOGY; SEMICONDUCTING SILICON; THIN FILMS;

SUPERSONIC MOLECULAR JET EPITAXY;

EPITAXIAL GROWTH;

EID: 12844266382     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00121-X     Document Type: Article

References (7)

1. M.C. Peckerer, F.K. Perkins, E.A. Dobisz, and O.J. Glembocki, in Handbook of Microlithography, Micromachining, and Microfabrication, Vol. 1, editor P. Rai-Choudhury, SPIE, Belligham, 1997.
2. R. Notzel, J. Temmyo, A. Kozen, T. Tanamura, T. Fukui, and H. Hasegawa, Appl. Phys. Lett. 66 (1995) 2525.
3. Gyula Eres, F.Y.C. Hui, T.G. Thundat, and D.C. Joy, J. Vac. Sci. Technol. B, (Nov/Dec 1997).
4. F.Y.C. Hui, Gyula Eres, and D.C. Joy, (submitted to Appl. Phys. Lett.)
5. D. Graf, M. Grudner, and R. Schulz, J. Appl. Phys. 68 (1990) 5155.
6. Y. Wang, M.J. Bronikowski, R.J. Hamers, Surf. Sci. 311 (1994) 64.
7. S. Takami, Y. Egashira, I. Honma, and H. Komiyama, Appl. Phys. Lett. 66 (1995) 1527.