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Volumn 152, Issue 1, 2005, Pages

Uniformity control of Ni thin-film microstructures deposited by through-mask plating

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CURRENT DENSITY; ELECTROPHORESIS; ELECTROPLATING; HIGH TEMPERATURE EFFECTS; METALLIC FILMS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; MICROSTRUCTURE; NICKEL; PHOTORESISTS; SPUTTERING; THERMAL EFFECTS;

EID: 12744269328     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1833320     Document Type: Article
Times cited : (62)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.