메뉴 건너뛰기




Volumn 17, Issue 5, 2004, Pages 677-684

KMPR photoresist process optimization using factorial experimental design

Author keywords

[No Author keywords available]

Indexed keywords

TETRAMETHYLAMMONIUM;

EID: 12444333484     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.677     Document Type: Conference Paper
Times cited : (2)

References (4)
  • 1
    • 0012058586 scopus 로고
    • Applying statistics to solving chemical problems
    • "Applying Statistics to Solving Chemical Problems", Chemtech, 17, 167-169 (1987).
    • (1987) Chemtech , vol.17 , pp. 167-169
  • 3
    • 0035463766 scopus 로고    scopus 로고
    • Chemical & physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
    • W. Hinsberg, F. Houle, M. Sanchez & G. Wallraff, "Chemical & Physical Aspects of the Post-Exposure Baking Process used for Positive-tone Chemically Amplified Resists", IBM J. Res. & Dev. Vol. 45 No. 5, September (2001).
    • (2001) IBM J. Res. & Dev. , vol.45 , Issue.5 SEPTEMBER
    • Hinsberg, W.1    Houle, F.2    Sanchez, M.3    Wallraff, G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.