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Volumn 17, Issue 5, 2004, Pages 677-684
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KMPR photoresist process optimization using factorial experimental design
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Author keywords
[No Author keywords available]
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Indexed keywords
TETRAMETHYLAMMONIUM;
CHEMICAL COMPOSITION;
CONFERENCE PAPER;
DIFFRACTION;
EVALUATION;
EXCITATION CONTRACTION COUPLING;
FACTORIAL ANALYSIS;
FILM;
KMPR PHOTORESIST PROCESS;
MATERIAL COATING;
MATHEMATICAL ANALYSIS;
PHOTOACTIVATION;
PHOTOCHEMICAL EFFICIENCY;
PROCESS MODEL;
PROCESS OPTIMIZATION;
TIME;
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EID: 12444333484
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.17.677 Document Type: Conference Paper |
Times cited : (2)
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References (4)
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