Production of multi-charged ions in the RIKEN 18 GHz ECRIS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 226, Issue 3, 2004, Pages 392-400

  Nakagawa, T ^a   Higurashi, Y ^a   Kidera, M ^a   Aihara, T ^b   Kase, M ^a   Yano, Y ^a  

^a RIKEN   (Japan)

^b Japan   (Japan)

Author keywords

Bias disc position; Electron cyclotron resonance ion source (ECRIS); Magnetic field configuration; Negative voltage of bias disc; Plasma electrode position

Indexed keywords

ELECTRIC CHARGE; ELECTRIC POTENTIAL; ELECTRODES; INERT GASES; ION BEAMS; ION SOURCES; IONS; MAGNETIC DEVICES; MAGNETIC FIELDS; PLASMAS;

BIAS DISC POSITION; ELECTRON-CYCLOTRON RESONANCE ION SOURCES (ECRIS); MAGNETIC FIELD CONFIGURATIONS; NEGATIVE VOLTAGE OF BIAS DISC; PLASMA ELECTRODE POSITION;

ELECTRON CYCLOTRON RESONANCE;

EID: 12444259803     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.06.040     Document Type: Article

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