Effect of Shot Noise and Secondary Emission Noise in Scanning Electron Microscope Images

Scanning

Volumn 26, Issue 1, 2004, Pages 36-40

  Sim, Kok Swee ^a,b   Thong, J T L ^a   Phang, J C H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b MULTIMEDIA UNIVERSITY   (Malaysia)

Author keywords

Binomial distribution; Poisson distribution; Secondary emission noise; Shot noise

Indexed keywords

BACKSCATTERING; GOLD; SCANNING ELECTRON MICROSCOPY; SIGNAL TO NOISE RATIO; SILICON;

EMISSION PROPERTIES; SECONDARY ELECTRON YIELD;

SPURIOUS SIGNAL NOISE;

GOLD; SILICON;

ARTICLE; BINOMIAL DISTRIBUTION; EMISSION NOISE; MATHEMATICAL ANALYSIS; NOISE; POISSON DISTRIBUTION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SHOT NOISE; SIGNAL NOISE RATIO; SIMULATION;

EID: 1242318845     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.4950260106     Document Type: Article

References (6)

1. Drescher H, Reimer L, Seidel H: Rückstreukoeffizient und Sekundarelektronen Ausbeute von 10-100keV, Z Angew, Phys 29, 331-336 (1970)
2. Dubbeldam L: Electron beam interaction with specimen (Ed. Thong JTL). Plenum Press, New York (1993) 218-223
3. Peters KR: Conditions required for high quality high magnification images in the secondary electron-I scanning electron microscopy. Scan Electr Microsc IV, 1359-1372 (1982)
4. Reimer L: Scanning electron microscopy. Springer Series in Optical Sciences. Springer, Berlin, Heidelberg (1985)
5. Reimer L: Scanning electron microscopy. Springer Series in Optical Sciences. Springer, Berlin, Heidelberg (1998)
6. Thong JTL, Sim KS, Phang JCH: Single-image signal to noise ratio estimation. Scanning 23, 328-336 (2001)