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Volumn 2 4, Issue 304, 2002, Pages 272-283+237+430

Coaxial microwave excitation device to ionize vapor sputtered by the magnetron;Dispositif coaxial d'excitation micro-ondes pour l'ionisation de vapeur pulvérisée par magnétron

Author keywords

Langmuir probe; Low pressure discharge; Optical spectroscopy; Planar magnetron discharge Microwave discharge; Sputtering

Indexed keywords

CARRIER CONCENTRATION; CHROMIUM; DEPOSITION; IONIZATION; LIGHT ABSORPTION; MAGNETRON SPUTTERING; PRESSURE EFFECTS; THIN FILMS;

EID: 1242313297     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (9)
  • 1
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    • Noyes Publications, Park Ridge, New Jersey, U.S.A.
    • Handbook of Plasma Processing Technology: "Fundamentals, Etching, Deposition, and Surface Interactions". Edited by STEPHEN M. ROSSNAGEL, JEROME J. CUOMO, WILLIAM D. WESTWOOD - Noyes Publications, Park Ridge, New Jersey, U.S.A. 1990.
    • (1990) Handbook of Plasma Processing Technology
    • Rossnagel, S.M.1    Cuomo, J.J.2    Westwood, W.D.3
  • 5
    • 3142722093 scopus 로고    scopus 로고
    • rd International workshop on microwave discharges: Fundamentals and applications
    • EDP Sciences Les Ulis France, Pr7
    • rd International Workshop on Microwave Discharges: Fundamentals and Applications, Edited by C. BOISSE-LAPORTE, J. MAREC - EDP Sciences Les Ulis France, Journal de Physique IV, Vol.8, Pr7, 1998.
    • (1998) Journal de Physique IV , vol.8
    • Boisse-Laporte, C.1    Marec, J.2
  • 6
    • 0026190546 scopus 로고
    • Plasma sources based on the propagation of electromagnetic waves
    • M. MOISAN, Z.ZAKRZEWSKI - "Plasma sources based on the propagation of electromagnetic waves". J.Phys. D: Appl. Phys. 24, 1025, 1991.
    • (1991) J.Phys. D: Appl. Phys. , vol.24 , pp. 1025
    • Moisan, M.1    Zakrzewski, Z.2
  • 9
    • 0019021889 scopus 로고
    • Optical emission spectroscopy of reactive plasmas. A method for correlating emission intensities to reactive particle density
    • J.W.COBURN, M.J.CHEN - "Optical emission spectroscopy of reactive plasmas. A method for correlating emission intensities to reactive particle density". J. Appl. Phys., 51, 3134, 1980.
    • (1980) J. Appl. Phys. , vol.51 , pp. 3134
    • Coburn, J.W.1    Hen, M.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.