Effect of Chlorine on Rayleigh Scattering Reduction in Silica Glass

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 12 B, 2003, Pages

  Kakiuchida, Hiroshi ^a   Sekiya, Edson H ^b   Saito, Kazuya ^a   Ikushima, Akira J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Chlorine dopant; Concentration fluctuation; Density fluctuation; Fictive temperature; Optical loss; Polarizabllity; Rayleigh ratio; Silica glass

Indexed keywords

CHLORINE; DOPING (ADDITIVES); ERROR ANALYSIS; GLASS FIBERS; GLASS MANUFACTURE; HEAT TREATMENT; METHANOL; POLARIZATION; RAYLEIGH SCATTERING; REFRACTIVE INDEX; WAVELENGTH DIVISION MULTIPLEXING;

CHLORINE DOPANT; CONCENTRATION FLUCTUATION; DENSITY FLUCTUATION; FICTIVE TEMPERATURE; OPTICAL LOSS; POLARIZABILITY; RAYLEIGH RATIO;

FUSED SILICA;

EID: 1242310433     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l1526     Document Type: Article

References (16)

1. H. Kanamori, H. Yokota, G. Tanaka, M. Watanabe, Y. Ishiguro, I. Yoshida, T. Kakii, S. Itoh, Y. Asano and S. Tanaka: IEEE J. Lightwave Technol. 4 (1986) 1144.
2. S. Sakaguchi and S. Todoroki: J. Non-Cryst. Solids 244 (1999) 232.
3. G. A. Thomas, B. I. Sraiman, P. F. Glodis and M. J. Stephen: Nature 404 (2000) 262.
4. K. Tsujikawa, K. Tajima and M. Ohashi: IEEE J. Lightwave Technol. 18 (2000) 1528.
5. M. E. Lines: J. Appl. Phys. 55 (1984) 4052.
6. J. Schroeder: Treatise on Materials Science and Technology, Vol. 12, Class 1: Interaction with Electromagnetic Radiation, eds. M. Tomozawa and R. H. Doremus (Academic Press, New York, 1969) p. 157.
7. G. W. Scherer: Relaxation in Glass and Composites (Krieger, Florida, 1992) p. 113.
8. D.-L. Kim and M. Tomozawa: J. Non-Cryst. Solids 286 (2001) 132.
9. K. Saito and A. J. Ikushima: Appl. Phys. Lett. 73 (1998) 1209.
10. A. Agarwal, K. M. Davis and M. Tomozawa: J. Non-Cryst. Solids 185 (1995) 191.
11. H. Kakiuchida, K. Saito and A. J. Ikushima: J. Appl. Phys. 93 (2003) 777.
12. H. Kakiuchida, K. Saito and A. J. Ikushima: Jpn. J. Appl. Phys. 42 (2003) 6516.
13. See, for example, E. Moreels, W. De Ceuninck and R. Finsy: J. Chem. Phys. 86 (1987) 618.
14. K. Saito and A. J. Ikushima: J. Appl. Phys. 91 (2002) 4886.
15. S. Yamagata: J. Ceram. Soc. Jpn. 100 (1992) 337.
16. H. Wehr and D. Wiechert: Mater. Res. Bull. 21 (1986) 559.