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Volumn 26, Issue 1, 2004, Pages 19-20
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Porous CVD ultra-low-k for 65nm and beyond
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DENSIFICATION;
DIFFUSION;
ELASTIC MODULI;
ELECTRIC PROPERTIES;
ETCHING;
HARDNESS TESTING;
HYDROGENATION;
OPTIMIZATION;
PERMITTIVITY;
PORE SIZE;
POROSITY;
SILICON CARBIDE;
STRESS ANALYSIS;
TRANSMISSION ELECTRON MICROSCOPY;
CHEMICAL MECHANICAL PLANARIZATION (CMP);
PRECURSOR GASES;
DIELECTRIC FILMS;
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EID: 1242284540
PISSN: 02656027
EISSN: None
Source Type: Journal
DOI: None Document Type: Review |
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Times cited : (1)
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References (0)
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