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Volumn 76, Issue 6, 2005, Pages

Investigation of machine compliance uniformity for nanoindentation screening of wafer-supported libraries

Author keywords

[No Author keywords available]

Indexed keywords

MACHINE COMPLIANCE UNIFORMITY; NANOINDENTATION; TWEEZERS; VACUUM RINGS;

EID: 12344276274     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1906089     Document Type: Article
Times cited : (12)

References (12)
  • 2
    • 12344311193 scopus 로고    scopus 로고
    • For a review article on the use of nanoindentation in combinatorial materials science, see O. L. Warren and T. J. Wyrobek, Meas. Sci. Technol. 16, 100 (2005).
    • (2005) Meas. Sci. Technol. , vol.16 , pp. 100
    • Warren, O.L.1    Wyrobek, T.J.2
  • 5
    • 20644448660 scopus 로고    scopus 로고
    • ISO 14577-1:2002, ISO 14577-2:2002, and ISO 14577-3:2002 are ratified standards for instrumented indentation testing.
    • ISO 14577-1:2002, ISO 14577-2:2002, and ISO 14577-3:2002 are ratified standards for instrumented indentation testing.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.