Photocuring and photolithography of proton-conducting polymers bearing weak and strong acids

Chemistry of Materials

Volumn 17, Issue 2, 2005, Pages 387-394

  Schmeisser, Jennifer ^a   Holdcroft, Steven ^a   Yu, Jianfei ^b   Ngo, Tran ^b   McLean, Ged ^b  

^a SIMON FRASER UNIVERSITY   (Canada)

^b Angstrom Power Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; DISSOCIATION; PHOTOLITHOGRAPHY; POLYELECTROLYTES; STATISTICAL METHODS; THIN FILMS;

PHOTOCURING; PROTON-CONDUCTING POLYMERS; PROTON-EXCHANGE MEMBRANES; SEMI-INTERPENETRATING NETWORKS (SEMI-IPN);

POLYMERS;

ACID; POLYELECTROLYTE; POLYMER;

ARTICLE; CHEMICAL COMPOSITION; CROSS LINKING; FLUORINATION; MEMBRANE COMPONENT; PHASE SEPARATION; PHOTOOXIDATION; POLYMERIZATION; PROTON TRANSPORT; SOLUBILITY; SULFONATION; TECHNIQUE;

EID: 12344268634     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm049083z     Document Type: Article

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