Fabrication of photonic integrated circuits by DUV-induced modification of polymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5451, Issue , 2004, Pages 24-31

  Henzi, P ^a   Rabus, D G ^a   Wallrabe, U ^a   Mohr, J ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

DUV lithography; Photonic integrated circuit; Polymer; Telecommunication; Waveguide

Indexed keywords

CHEMICAL MODIFICATION; INJECTION MOLDING; INTEGRATED CIRCUITS; LIGHT POLARIZATION; LIGHT TRANSMISSION; MICROPROCESSOR CHIPS; MIRRORS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PHOTONS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SENSORS; TELECOMMUNICATION SYSTEMS; THERMAL EXPANSION; ULTRAVIOLET RADIATION;

DUV LIGTHOGRAPHY; HOT EMBOSSING; PHOTONIC INTEGRATED CIRCUITS; POLYMER WAVEGUIDES;

INTEGRATED OPTOELECTRONICS;

EID: 12344249830     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544481     Document Type: Conference Paper

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