CeO2 thin films as buffer layers for Si/YBCO integrated microelectronics

Materials Research Society Symposium - Proceedings

Volumn 768, Issue , 2003, Pages 69-74

  Tresso, Elena ^a   Ballarini, V ^a   Chiodoni, A ^a   Gerbaldo, R ^a   Ghigo, G ^a   Gozzelino, L ^a   Mezzetti, E ^a   Minetti, B ^a   Pirri, C F ^a   Tallarida, G ^b   Ferrari, S ^b   Camerlingo, C ^c  

^a POLITECNICO DI TORINO   (Italy)

^b LABORATORIO MDM   (Italy)

^c CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CERIUM COMPOUNDS; DEPOSITION; DIFFRACTION; MICROELECTRONICS; RAMAN SPECTROSCOPY; SEMICONDUCTOR MATERIALS; SPUTTERING; THERMAL EXPANSION; THERMOMETERS; X RAY DIFFRACTION ANALYSIS;

BUFFER LAYERS; SUPERCONDUCTOR INTERFACE;

THIN FILMS;

EID: 12144287007     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-768-g3.9     Document Type: Conference Paper

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