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Volumn , Issue , 2000, Pages 1-19

Problems and solutions for downsizing CMOS below 0.1 μm

Author keywords

[No Author keywords available]

Indexed keywords

CMOS DEVICES; CMOS TECHNOLOGY; DEVICE STRUCTURES;

EID: 11944265423     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (30)
  • 14
    • 0000637882 scopus 로고    scopus 로고
    • 2 and the Si-Si02 interface-4
    • 2 and the Si-Si02 interface-4", PV2000-2, 365 (2000)
    • (2000) Proc. ECS Symp. , vol.PV2000-2 , pp. 365
    • Alam, M.A.1
  • 20
    • 84864682372 scopus 로고    scopus 로고
    • Advances in rapid thermal processing
    • D. F. Downey et al., Proc. ECS Symp., "Advances in Rapid Thermal Processing", PV99-10,151 (1999).
    • (1999) Proc. ECS Symp. , vol.PV99-10 , pp. 151
    • Downey, D.F.1
  • 30
    • 84864645751 scopus 로고    scopus 로고
    • ULSI process integration
    • H. Takato et al., Proc. ECS Symp., "ULSI Process Integration", PV99-18, 107 (1999)
    • (1999) Proc. ECS Symp. , vol.PV99-18 , pp. 107
    • Takato, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.