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Physical Review Letters

Volumn 69, Issue 2, 1992, Pages 320-322

Stress-induced amorphization of silicon crystal by mechanical scratching

(2) Minowa, Kyoko a Sumino, Koji a

a TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11944253890 PISSN: 00319007 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevLett.69.320 Document Type: Article

Times cited : (116)

References (11)

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3
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- Eremenko, V.G.¹ Nikitenko, V.I.²

4
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- T. Kawakami, Ph.D. thesis, Osaka University, 1973 (unpublished).

5
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6
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- Surface damage on abraded silicon specimens
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7
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8
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- McGraw-Hill, New York
- (1982) Theory of Elasticity , pp. 403-409
- Timoshenko, S.P.¹ Goodier, J.N.²

9
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- McGraw-Hill, New York
- (1968) Theory of Dislocations , pp. 761
- Hirth, J.P.¹ Lothe, J.²

10
- 84996251897
- Theoretical strength of perfect crystals
- (1966) Philosophical Magazine , vol.14 , pp. 925
- Tyson, W.R.¹

11
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- edited by, D. S. Kyriakos, O. E. Valassiades, Chalkidiki, Porto Carras
- (1990) Proceedings of the Fourth International Conference on High Pressure in Semiconductor Physics , pp. 188
- Imai, M.¹ Mitamura, T.² Yaoita, K.³ Tsuji, K.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.