Ultraviolet femtosecond and nanosecond laser ablation of silicon: Ablation efficiency and laser-induced plasma expansion

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5448, Issue PART 2, 2004, Pages 1150-1158

  Zeng, Xianzhong ^a,b   Mao, Xianglei ^a   Greif, Ralph ^b   Russo, Richard E ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Laser ablation; Laser induced breakdown spectroscopy; Laser induced plasma; Shock wave

Indexed keywords

CARRIER CONCENTRATION; HEATING; IMAGING TECHNIQUES; LASER BEAMS; LASER PULSES; MELTING; SHOCK WAVES; SILICON; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS; VAPORIZATION;

LASER-INDUCED BREAKDOWN SPECTROSCOPY; LASER-INDUCED PLASMA; PULSE NUMBERS; ULTRAVIOLET FEMTOSECONDS;

LASER ABLATION;

EID: 11844301343     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544401     Document Type: Conference Paper

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