Results from a new die-to-database reticle inspection platform

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 1, 2004, Pages 265-278

  Broadbent, William H ^a   Wiley, James N ^a   Saidin, Zain K ^a   Watson, Sterling G ^a   Alles, David S ^a   Zurbrick, Larry S ^a   Mack, Chris A ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

193nm; 248nm; Defect; DUV; Flux; Inspection; OPC; Reticle; Sensitivity; SRAF

Indexed keywords

COMPUTER ARCHITECTURE; COMPUTER PROGRAMMING; DEFECTS; INSPECTION; LIGHTING; PHASE SHIFT; QUARTZ; SENSITIVITY ANALYSIS; STANDARDS; ULTRAVIOLET RADIATION;

193NM; 248NM; DUV; FLUX; OPC; RETICLE; SRAF;

DATABASE SYSTEMS;

EID: 11844296092     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557784     Document Type: Conference Paper

References (1)

1. W. Broadbent, et al, "Results from a new reticle defect inspection platform", 23rd Annual BACUS Symposium on Photomask Technology, Kurt R. Kimmel, ed., Proc SPIE Vol 5256, p. 474-488, 2003