Comment on "Low level plasma formation in a carbon velvet cesium iodide coated cathode" [Phys. Plasmas 11, 1680 (2004)]

Physics of Plasmas

Volumn 11, Issue 12, 2004, Pages 5730-5733

  Saveliev, Y M ^a   Krasik, Ya E ^b   Shiffler, D ^c   Heggemeier, J ^c   Lacour, M ^c   Golby, K ^c   Ruebush, M ^c  

^a UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^c AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11844249307     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1811617     Document Type: Note

References (0)