Photosensitive sol-gel precursors for direct ultra-violet patterning of SiO2 and PZT materials

Journal De Physique. IV : JP

Volumn 8, Issue 9, 1998, Pages

  Faure, S P ^a   Chaux, O ^a,b   Gaucher, P ^b  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b THALES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744314442     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1998911     Document Type: Article

References (5)

1. ERANIAN A and DUBOIS J.C., Revue technique Thomson-CSF 19 (1986) 95-211.
2. RENOU-HASSINE F., Etude de l'exposition de résines photosensibles positives utilisées dans la fabrication des semi-conducteurs, Thèse de Docteur-Ingénieur, Université de Paris-Sud, 1986 pp. 14.
3. P. GAUCHER, J HECTOR, J. C. KURFISS, "Organically modified sol-gel precursors for ferroelectric deposition by spin coating", in NATO Advanced research workshop, Villa del Mare (Italy), , (Ed) 1994, Science and technology of electroceramic thin films, 147-156, Kluwer Acad Pub (NL), 1995.
4. P. GAUCHER, J HECTOR, J. C. KURFISS, "Organically modified sol-gel precursors for ferroelectric deposition by spin coating", in NATO Advanced research workshop, Villa del Mare (Italy), , (Ed) 1994, Science and technology of electroceramic thin films, 147-156, Kluwer Acad Pub (NL), 1995.
5. VALENTE I., FAURE S.P., GAUCHER P., LIVAGE J., French Patent NO 8915174 Thomson-CSF (1989).