Membrane distortions in X-ray masks due to specific absorber features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 146-154

  Fisher, Adam H ^a   Engeistad, Roxann L ^a   Laudon, Matthew F ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b EPFL   (Switzerland)

Author keywords

Absorbers; Global distortions; Local distortions; Membranes; X ray lithography

Indexed keywords

MASKS; MEMBRANES; X RAY LITHOGRAPHY; X RAYS;

ABSORBERS; CLOSED-FORM ANALYTICAL SOLUTIONS; IN-PLANE DISTORTIONS; LOCAL DISTORTION; MEMBRANE DISTORTION; OUT-OF-PLANE DISTORTIONS; PATTERN PLACEMENT ERRORS; PATTERN PLACEMENTS;

FINITE ELEMENT METHOD;

EID: 11744305852     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275771     Document Type: Conference Paper

References (5)

1. Laudon, M., Engelstad, R., Thole, K., Dauksher, W., Resnick, D., Cummings, K., Seese, P., Johnson, W., "Modeling of In-Plane Distortions due to Variations in Absorber Stress," Microelectron. Eng., Vol. 30, pp. 227-230, 1996.
2. Laudon, M., "Impact of Fabrication Process on Patterned Thin-Film Mechanical Distortions," Ph.D. Dissertation, University of Wisconsin-Madison, 1996.
3. Laudon, M., Fisher, A., Engeistad, R., Cerrina, F., Cummings, K., Dauksher, W., Resnick, D., Johnson, W., Puisto, D., "Prediction of In-Plane Distortions due to Mask Fabrication Process," to appear in Microelectron. Eng., 1997.
4. ANSYS® Users Manual, Swanson Analysis Systems, Inc., Revision 5.0, Vol. III, page 4-471.
5. Ku, Y. C., Lim, M. H., Carter, J. M., Mondol, M. K., Moel, A., Smith, H. I., "Correlation of In-Plane and Out-of-Plane Distortion in X-ray Lithography Masks," J. Vac. Sci. Technol. B, Vol. 10, No. 6, pp. 3169-3172, 1992.