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Volumn 53, Issue 5, 1988, Pages 358-360

Electron yield of glow discharge cathode materials under helium ion bombardment

Author keywords

[No Author keywords available]

Indexed keywords


EID: 11744294451     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.100401     Document Type: Article
Times cited : (45)

References (27)
  • 22
    • 84950592369 scopus 로고
    • Ion Plasma Electron Gun Research, Contract N00014 77 C 0484, Hughes Res. Lab. December
    • (1977)
    • Clark, W.M.1    Palmer, J.A.2
  • 27
    • 84950592374 scopus 로고    scopus 로고
    • Maintaining the same voltage drop across the discharge for all cathode materials was not practically feasible. This would have required to overheat the setup with the several hundred watt electron beams produced by high yield materials, or alternatively to run the lower yield materials in a normal or near normal glow regime.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.