Evaluation of a new photomask CD metrology tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 198-207

  Dubuque, Leonard F ^a   Doe, Nicholas G ^b   St Cin, Patrick ^b  

^a IBM MICROELECTRONICS   (United States)

^b Technical Instruments Co   (United States)

Author keywords

CD measurements; Conlocal; IC photomask; IC reticule

Indexed keywords

DATA STORAGE EQUIPMENT; FITS AND TOLERANCES; GAGES; INTEGRATED CIRCUITS; PATTERN RECOGNITION; TECHNOLOGY; TESTING;

AND SYSTEMATIC ERRORS; CD ERRORS; CD MEASUREMENTS; CD METROLOGIES; CD VARIATIONS; CONLOCAL; CRITICAL DIMENSIONS; EDGE TECHNOLOGIES; EQUIPMENT SUPPLIERS; IC PHOTOMASK; IC RETICULE; MEASUREMENT SYSTEMS; METROLOGY TOOLS; NEW INSTRUMENTS; OPTICAL PATHS; REALISTIC TESTS; SINGLE POINTS; SYSTEM COMPONENTS; SYSTEM PERFORMANCES; SYSTEM SOFTWARES; TOTAL SYSTEM ERRORS;

PHOTOMASKS;

EID: 11744266276     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262804     Document Type: Conference Paper

References (5)

1. G. Q. Xiao and G. S. Kino, "A real-time confocal scanning optical microscope," SPIE Vol. 809 - Scanning Imaging Technology 1987
2. U.S. Patent #4927254, #5022743
3. "The National Technology Roadmap for Semiconductors," Semiconductor Industry Association, CA 1994.
4. D. Nyyssonen, "Linewidth calibration for bright-chromium photomasks," U.S. Department of Commerce, National Bureau of Standards, MD, May 1986
5. J. M. Jerke, et. al., "Interlaboratory study of linewidth measurements for antireflective chromium photomasks," U.S. Department of Commerce, National Bureau of Standards, MD, Nov 1982