Study of Bi-level resist system with conductive bottom layer for EB lithography

Journal of Photopolymer Science and Technology

Volumn 9, Issue 4, 1996, Pages 697-706

  Watanabe, Keiji ^a   Igarashi, Miwa ^a   Yano, Ei ^b   Hoshino, Eiichi ^b   Shirabe, Kotaro ^a   Nakaishi, Masafumi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

^b FUJITSU LIMITED ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744258064     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.697     Document Type: Article

References (18)

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