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Journal of Applied Physics

Volumn 58, Issue 2, 1985, Pages 653-658

Electrical properties of planar rf discharges for dry etching

(3) Van Roosmalen, A J a Van Den Hoek, W G M a Kalter, H a

a PHILIPS RESEARCH LABORATORIES (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644321945 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.336177 Document Type: Article

Times cited : (51)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.