Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1316-1320

  Smith, L L ^a   Read, W W ^a   Yang, C S ^a   Srinivasan, E ^a   Courtney, C H ^a   Lamb, H H ^a   Parsons, G N ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644321108     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581144     Document Type: Article

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