Influence of water absorption by silicate glass on the strains in passivated Al conductor lines

Journal of Electronic Materials

Volumn 27, Issue 7, 1998, Pages 853-857

  Kuschke, W M ^a   Carstanjen, H D ^b   Pazarkas, N ^b   Plachke, D W ^b   Arzt, E ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Al metallization; Passivation; Thin film strains; Water adsorption

Indexed keywords

EID: 11644308997     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-998-0109-0     Document Type: Article

References (22)

1. W.-M. Kuschke and E. Arzt, Appl. Phys. Lett. 64, 1097 (1994).
2. P.R. Besser, T.N. Marieb, J. Lee, P.A. Flinn and J.C. Bravman, J. Mater. Res. 11, 184 (1996).
3. P.A. Flinn, MRS Symp. Proc. 130, (Pittsburgh, PA: Mater. Res. Soc., 1989), p. 41.
4. L. Doucet and G. Carlotti, MRS Symp. Proc. 356, (Pittsburgh, PA: Mater. Res. Soc., 1995), p. 215.
5. S. Rojas, L. Zanotti, A. Borghesi, A. Sassella and G.U. Pignatel, J. Vac. Sci. Technol. B 11, 2081 (1993).
6. J.D. Romero, M. Khan, H. Fatemi and J. Turlo, J. Mater. Res. 6, 1996 (1991).
7. C. Chiang, G. Neubauer, A. Sauter Mack, K. Yoshioka, G. Cuan, P.A. Flinn and D.B. Fraser, MRS Symp. Proc. 265, (Pittsburgh, PA: Mater. Res. Soc., 1992), p. 219.
8. R.M. Levin, J. Electrochem. Soc. 129, 1765 (1982).
9. H.G. Tompkins and C. Tracy, J. Electrochem. Soc. 136, 2331 (1989).
10. P. Ambrée, F. Kreller, R. Wolf and K. Wandel, J. Vac. Sci. Technol. B 11, 614 (1993).
11. G.L. Holmberg, A.B. Kuper and F.D. Miraldi, J. Electrochem. Soc. 117, 677 (1970).
12. A. Shintani, S. Sugaki and H. Nakashima, J. Appl. Phys. 51, 4197 (1980).
13. I. Blech and U. Cohen, J. Appl. Phys. 53, 4202 (1982).
14. W.A. Lanford and M.J. Rand, J. Appl. Phys. 49, 2473 (1978).
15. S. Bader, E. Arzt, O. Kraft, J. Sanchez and W.D. Nix, Third European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, (1992), p. 351.
16. E. Arzt, O. Kraft, J. Sanchez, S. Bader and W.D. Nix, MRS Symp. Proc. 239, (Pittsburgh, PA: Mater. Res. Soc., 1992), p. 677.
17. S. Bader, P.A. Flinn, E. Arzt and W.D. Nix, J. Mater. Res. 9, 318 (1994).
18. I.C. Noyan and J.B. Cohen, Residual Stress-Measurement by Diffraction and Interpretation, (New York: Springer-Verlag, 1987).
19. P.R. Besser, S. Brennen and J.C. Bravman, J. Mater. Res. 9, 13 (1994).
20. P.A. Flinn and C. Chiang, J. Appl. Phys. 67, 2927 (1990).
21. Handbook of Modern Ion Beam Materials Analysis, ed. J.R. Tesmer and M. Nastasi (Pittsburgh, PA: Materials Research Society, 1995).
22. E. Kotai, NIM B85, 588 (1994).