Effects of nitrogen ion implantation on the thermal stability of tungsten thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 2, 1998, Pages 477-481

  Kim, Yong Tae ^a   Kwon, Chul Soon ^a   Kim, Dong Joon ^b   Park, Jong Wan ^b   Lee, Chang Woo ^c  

^a Korea Institute of Science and Technology   (South Korea)

^b Hanyang University   (South Korea)

^c Kookmin University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644300895     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581046     Document Type: Article

References (6)

1. J. Li, T. E. Seidel, and J. W. Mayer, Mater. Res. Soc. Bull. 19, 15 (1994).
2. C. S. Kwon, D. J. Kim, and Y. T. Kim, Mater. Res. Soc. Symp. Proc. 355, 441 (1995).
3. S. P. Murarka, Suicides for VLSI Applications (Academic, New York, 1983), Chap. 3.
4. Y. T. Kim, C. W. Lee, and C. Lee, J. Vac. Sci. Technol. B 12, 69 (1994).
5. C. W. Lee, Y. T. Kim, S.-K. Min, C. Lee, J. Y. Lee, and Y. W. Park, Mater. Res. Soc. Symp. Proc. 318, 335 (1994).
6. C. S. Kwon, Y. T. Kim, and I. H. Choi, Jpn. J. Appl. Phys., Part 1 34, 78 (1995).