Development of wide range energy focused ion beam lithography system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2484-2488

  Kinokuni, M ^a   Sawaragi, H ^a   Mimura, R ^a   Aihara, R ^a   Forchel, A ^b  

^a Eiko Engineering Co   (Japan)

^b UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644300806     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590195     Document Type: Article

References (7)

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4. D. H. Narum and R. F. W. Pease, J. Vac. Sci. Technol. B 6, 966 (1988).
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7. H. Paik, G. N. Lewis, E. J. Kirkland, and B. M. Siegel, J. Vac. Sci. Technol. B 3, 75 (1985).