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Physical Review Letters

Volumn 71, Issue 8, 1993, Pages 1234-1237

Identification of strained silicon layers at Si-SiO2 interfaces and clean Si surfaces by nonlinear optical spectroscopy

(4) Daum, W a Krause, H J a Reichel, U a Ibach, H a

a FORSCHUNGSZENTRUM JÜLICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11544281894 PISSN: 00319007 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevLett.71.1234 Document Type: Article

Times cited : (250)

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