Silicon dioxide chemical vapor deposition using silane and hydrogen peroxide

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 4, 1996, Pages 2767-2769

  Gaillard, Frédéric ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11544270262     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588828     Document Type: Article

References (13)

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