Surface segregation of silicon impurities in organic materials

Surface and Interface Analysis

Volumn 36, Issue 1, 2004, Pages 1-7

  Reijme, M A ^a   Denier van der Gon, A W ^a   Draxler, M ^b   Gildenpfennig, A ^c   Janssen, F J J ^a   Brongersma, H H ^a,c  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^c Calipso BV   (Netherlands)

Author keywords

ISS; LEIS; Poly(propyleneimine) dendrimer (DAB; PA)64 polycarbonate; Poly dialkoxy phenylenevinylene; Segregation; Siloxane; XPS

Indexed keywords

CONTACT ANGLE; DENDRIMERS; LIGHT EMITTING DIODES; ORGANIC POLYMERS; PLASTIC FILMS; POLYCARBONATES; SOLVENTS; SURFACE STRUCTURE; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

ISS; LEIS; ORGANIC MATERIALS; POLY-DIALKOXY PHENYLENEVINYLENE; SEGREGATION; SILOXANE;

SILICON;

EID: 1142293770     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1601     Document Type: Article

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